Growth, structure and stability of sputter-deposited MoS2 thin films

Author(s)
Reinhard Kaindl, Bernhard C. Bayer, Roland Resel, Thomas Müller, Viera Skakalova, Gerlinde Habler, Rainer Abart, Alexey S. Cherevan, Dominik Eder, Maxime Blatter, Fabian Fischer, Jannik C. Meyer, Dmitry K. Polyushkin, Wolfgang Waldhauser
Organisation(s)
Physics of Nanostructured Materials, Department of Lithospheric Research
Journal
Beilstein Journal of Nanotechnology
Volume
8
Pages
1115-1126
No. of pages
12
ISSN
2190-4286
DOI
https://doi.org/10.3762/bjnano.8.113
Publication date
05-2017
Publication status
Published
Peer reviewed
Yes
Austrian Fields of Science 2012
104011 Materials chemistry, 103009 Solid state physics, 103020 Surface physics
Keywords
electrode, hydrogen evolution reaction (HER), magnetron sputter deposition, MoS2, reticulated vitreous carbon (RVC) foam, SiO2/Si substrate, CHEMICAL-VAPOR-DEPOSITION, TRANSITION-METAL DICHALCOGENIDES, RETICULATED VITREOUS CARBON, HYDROGEN EVOLUTION, MOLYBDENUM-DISULFIDE, ELECTRODE MATERIAL, RAMAN-SCATTERING, BAND-STRUCTURES, ATOMIC LAYERS, HIGH-MOBILITY
Portal url
https://ucris.univie.ac.at/portal/en/publications/growth-structure-and-stability-of-sputterdeposited-mos2-thin-films(f530d46d-c7d5-4fb8-87a9-cfbfa401da05).html