Cleaning graphene

Author(s)
Mukesh Tripathi, Andreas Mittelberger, Kimmo Mustonen, Clemens Mangler, Jani Kotakoski, Jannik C. Meyer, Toma Susi
Abstract

Surface impurities and contamination often seriously degrade the properties of two-dimensional materials such as graphene. To remove contamination, thermal annealing is commonly used. We present a comparative analysis of annealing treatments in air and in vacuum, both ex situ and "pre situ," where an ultra-high vacuum treatment chamber is directly connected to an aberration-corrected scanning transmission electron microscope. While ex situ treatments do remove contamination, it is challenging to obtain atomically clean surfaces after ambient transfer. However, pre situ cleaning with radiative or laser heating appears reliable and well suited to clean graphene without damage to most suspended areas. Pre situ annealing of typical dirty graphene samples yields atomically clean areas several hundred nm2 in size.

Organisation(s)
Physics of Nanostructured Materials
Journal
Physica Status Solidi. Rapid Research Letters
Volume
11
No. of pages
5
ISSN
1862-6254
Publication date
07-2017
Publication status
E-pub ahead of print
Peer reviewed
Yes
Austrian Fields of Science 2012
210004 Nanomaterials, 103015 Condensed matter, 104011 Materials chemistry, 103042 Electron microscopy
Keywords
Annealing, Cleaning, Graphene, Scanning transmission electron microscopy
ASJC Scopus subject areas
Materials Science(all), Condensed Matter Physics
Electronic versions
https://arxiv.org/abs/1704.08038
Portal url
https://ucris.univie.ac.at/portal/en/publications/cleaning-graphene(b5a7ca98-7942-4869-88f2-1f7f7777ad52).html