Reactive intercalation and oxidation at the buried graphene-germanium interface
- Author(s)
- Philipp Braeuninger-Weimer, Oliver Burton, Robert S. Weatherup, Ruizhi Wang, Pavel Dudin, Barry Brennan, Andrew J. Pollard, Bernhard C. Bayer, Vlad P. Veigang-Radulescu, Jannik C. Meyer, Billy J. Murdoch, Peter J. Cumpson, Stephan Hofmann
- Abstract
We explore a number of different electrochemical, wet chemical, and gas phase approaches to study intercalation and oxidation at the buried graphene-Ge interface. While the previous literature focused on the passivation of the Ge surface by chemical vapor deposited graphene, we show that particularly via electrochemical intercalation in a 0.25 N solution of anhydrous sodium acetate in glacial acetic acid, this passivation can be overcome to grow GeO2 under graphene. Angle resolved photoemission spectroscopy, Raman spectroscopy, He ion microscopy, and time-of-flight secondary ion mass spectrometry show that the monolayer graphene remains undamaged and its intrinsic strain is released by the interface oxidation. Graphene acts as a protection layer for the as-grown Ge oxide, and we discuss how these insights can be utilized for new processing approaches.
- Organisation(s)
- Physics of Nanostructured Materials
- External organisation(s)
- University of Cambridge, University of Manchester, Diamond Light Source Ltd, Newcastle University, Royal Melbourne Institute of Technology, Technische Universität Wien, National Physical Laboratory, Middlesex, UK
- Journal
- APL Materials
- Volume
- 7
- No. of pages
- 8
- ISSN
- 2166-532X
- DOI
- https://doi.org/10.1063/1.5098351
- Publication date
- 07-2019
- Peer reviewed
- Yes
- Austrian Fields of Science 2012
- 103018 Materials physics, 104026 Spectroscopy
- Keywords
- Portal url
- https://ucris.univie.ac.at/portal/en/publications/reactive-intercalation-and-oxidation-at-the-buried-graphenegermanium-interface(078f411a-af38-40c4-b94c-96f9a11ad1a9).html