Reactive intercalation and oxidation at the buried graphene-germanium interface

Author(s)
Philipp Braeuninger-Weimer, Oliver Burton, Robert S. Weatherup, Ruizhi Wang, Pavel Dudin, Barry Brennan, Andrew J. Pollard, Bernhard C. Bayer, Vlad P. Veigang-Radulescu, Jannik C. Meyer, Billy J. Murdoch, Peter J. Cumpson, Stephan Hofmann
Abstract

We explore a number of different electrochemical, wet chemical, and gas phase approaches to study intercalation and oxidation at the buried graphene-Ge interface. While the previous literature focused on the passivation of the Ge surface by chemical vapor deposited graphene, we show that particularly via electrochemical intercalation in a 0.25 N solution of anhydrous sodium acetate in glacial acetic acid, this passivation can be overcome to grow GeO2 under graphene. Angle resolved photoemission spectroscopy, Raman spectroscopy, He ion microscopy, and time-of-flight secondary ion mass spectrometry show that the monolayer graphene remains undamaged and its intrinsic strain is released by the interface oxidation. Graphene acts as a protection layer for the as-grown Ge oxide, and we discuss how these insights can be utilized for new processing approaches.

Organisation(s)
Physics of Nanostructured Materials
External organisation(s)
University of Cambridge, University of Manchester, Diamond Light Source Ltd, Newcastle University, Royal Melbourne Institute of Technology, Technische Universität Wien, National Physical Laboratory, Middlesex, UK
Journal
APL Materials
Volume
7
No. of pages
8
ISSN
2166-532X
DOI
https://doi.org/10.1063/1.5098351
Publication date
07-2019
Peer reviewed
Yes
Austrian Fields of Science 2012
103018 Materials physics, 104026 Spectroscopy
Keywords
Portal url
https://ucris.univie.ac.at/portal/en/publications/reactive-intercalation-and-oxidation-at-the-buried-graphenegermanium-interface(078f411a-af38-40c4-b94c-96f9a11ad1a9).html