Nucleation Control for Large, Single Crystalline Domains of Mono layer Hexagonal Boron Nitride via Si-Doped Fe Catalysts
- Author(s)
- Sabina Caneva, Robert S. Weatherup, Bernhard C. Bayer, Barry Brennan, Steve J. Spencer, Ken Mingard, Andrea Cabrero-Vilatela, Carsten Baehtz, Andrew J. Pollard, Stephan Hofmann
- Abstract
The scalable chemical vapor deposition of monolayer hexagonal boron nitride (h-BN) single crystals, with lateral dimensions of similar to 0.3 mm, and of continuous h-BN monolayer films With large domain sizes (>25 mu m) is demonstrated via an admixture of Si to Fe catalyst films. A simple thin-filth Fe/'SiO2/Si catalyst system is used to show that controlled Si diffusion into the Fe catalyst allows exclusive nucleation of monolayer h-BN with very low nucleation densities upon exposure to undiluted borazine. Our systematic in situ and ex situ characterization of this catalyst system establishes, a basis for further rational catalyst design for compound 2D materials.
- Organisation(s)
- Physics of Nanostructured Materials
- External organisation(s)
- University of Cambridge, Helmholtz-Zentrum Dresden-Rossendorf, National Physical Laboratory
- Journal
- Nano Letters: a journal dedicated to nanoscience and nanotechnology
- Volume
- 15
- Pages
- 1867-1875
- No. of pages
- 9
- ISSN
- 1530-6984
- DOI
- https://doi.org/10.1021/nl5046632
- Publication date
- 03-2015
- Peer reviewed
- Yes
- Austrian Fields of Science 2012
- 210006 Nanotechnology, 103018 Materials physics
- Keywords
- ASJC Scopus subject areas
- Condensed Matter Physics, Mechanical Engineering, Bioengineering, Chemistry(all), Materials Science(all)
- Portal url
- https://ucris.univie.ac.at/portal/en/publications/nucleation-control-for-large-single-crystalline-domains-of-mono-layer-hexagonal-boron-nitride-via-sidoped-fe-catalysts(7617d54c-98f0-42cd-975d-c728b24814d8).html