Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD
- Author(s)
- Sabina Caneva, Robert S. Weatherup, Bernhard C. Bayer, Raoul Blume, Andrea Cabrero-Vilatela, Philipp Braeuninger-Weirner, Marie-Blandine Martin, Ruizhi Wang, Carsten Baehtz, Robert Schloegl, Jannik C. Meyer, Stephan Hofmann
- Abstract
Highly controlled Fe-catalyzed growth of monolayer hexagonal boron nitride (h-BN) films is demonstrated by the dissolution of nitrogen into the catalyst bulk via NH3 exposure prior to the actual growth step. This "pre-filling" of the catalyst bulk reservoir allows us to control and limit the uptake of B and N species during borazine exposure and thereby to control the incubation time and h-BN growth kinetics while also limiting the contribution of uncontrolled precipitation-driven h-BN growth during cooling. Using in situ X-ray diffraction and in situ X-ray photoelectron spectroscopy combined with systematic growth calibrations, we develop an understanding and framework for engineering the catalyst bulk reservoir to optimize the growth process, which is also relevant to other 2D materials and their heterostructures.
- Organisation(s)
- Physics of Nanostructured Materials
- External organisation(s)
- University of Cambridge, Lawrence Berkeley National Laboratory, Helmholtz-Zentrum Berlin für Materialien und Energie, Helmholtz-Zentrum Dresden-Rossendorf, Fritz-Haber-Institut der Max-Planck-Gesellschaft
- Journal
- Nano Letters: a journal dedicated to nanoscience and nanotechnology
- Volume
- 16
- Pages
- 1250-1261
- No. of pages
- 12
- ISSN
- 1530-6984
- DOI
- https://doi.org/10.1021/acs.nanolett.5b04586
- Publication date
- 02-2016
- Peer reviewed
- Yes
- Austrian Fields of Science 2012
- 103015 Condensed matter, 103018 Materials physics
- Keywords
- ASJC Scopus subject areas
- Condensed Matter Physics, Mechanical Engineering, Bioengineering, Chemistry(all), Materials Science(all)
- Portal url
- https://ucris.univie.ac.at/portal/en/publications/controlling-catalyst-bulk-reservoir-effects-for-monolayer-hexagonal-boron-nitride-cvd(4ffc4ef2-85af-45b7-bd24-e814967a2a7f).html